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Partially Funded Dual PhD Scholarships Provided by Liverpool and Tsing Hua University

Partially Funded Dual PhD Scholarships Provided by Liverpool and Tsing Hua University

University of Liverpool

University of Liverpool

Nonprofit organization, Browse similar opportunities

OPPORTUNITY DETAILS

Total reward
0 $
Nonprofit organization
Deadline
30 Apr 2021
Study level
Opportunity type
Specialities
Opportunity funding
Full funding
Eligible Countries
Eligible Region
All Regions

Liverpool University is offering PhD program scholarships in low-cost integrated spintronic terahertz transceiver. This project is part of a 4-year Dual PhD degree programme between the National Tsing Hua University (Taiwan) and the University of Liverpool (England). As part of the NTHU-UoL Dual PhD Award students are in the unique position of being able to gain 2 PhD awards at the end of their degree from two internationally recognised world-leading Universities.

Project Description:-

  • The latest set of projects targeted goal #11 from the UN Sustainable Development Goals: Sustainable Cities and Communities. 

  • In the field of terahertz science, the development of future systems is significantly constrained by the bulky and low-power nature of terahertz sources. Recently, however, observations suggest that new, high efficiency and chip-integrated sources can be developed using the interconversion of spin and charge currents.

  • In this PhD project, the properties of low-cost, spin-orbit coupled layers, will be investigated to realize cost-efficient spintronic emitters. Spintronic characterization tools, including spin Hall effects and magnetoresistive measurements, will be used to characterize the magnetic properties of the layers. 

Responsibilities:-

The student will process the spin-orbit coupled layers at NTHU into optimized plasmonic nanostructures, to realize high quantum efficiency devices, miniaturized down to chip-scale.

Benefits:-

  • This project is a part of a 4-year dual PhD programme between National Tsing Hua University (Taiwan) and the University of Liverpool (England). Students should spend equal time studying in each institution. Both the UoL and NTHU have agreed to waive the tuition fees for the duration of the project and a stipend of $11,000 TWD/£280 GBP a month will be provided as a contribution to living costs.

  • As well as benefiting from a rich cultural experience, students can draw on large-scale national facilities of both countries and create a worldwide network of contacts across two continents.

  • The project provides the unique opportunity for a student to gain experience in a host of research techniques. Training in femtosecond device simulation, fabrication and characterization will be readily provided by NTHU. 

  • These complement that available at UoL, where the student will gain expertise in magnetic and spintronic characterisation as well a host of structural and chemical characterisation tools.

Admission Requirements:-

To complete the online application, you'll need:

  • School or college transcripts/ certificates.

  • University transcripts.

  • Degree certificates.

  • English language certificates (EU/International applicants only).

  • Personal statement.

  • Two references signed and on letter-headed paper (these should be academic references if you have been in full-time education in the last three years)

  • Research proposal (may be tested for plagiarism, collusion and other irregularities).

About the University of Liverpool:-

The University of Liverpool is a public university based in the city of Liverpool, England. Founded as a college in 1881, it gained its royal charter in 1903 with the ability to award degrees. Associated with nine Nobel Laureates, the University is recognised for its high-quality teaching and research. Its research collaborations extend worldwide and address many of the grand challenges facing mankind today. The University of Liverpool is a globally-focused institution with partnerships throughout the world, including research institutes, universities, governments and industrial organisations.

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